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用光激发荧光谱术分析测量磁控溅射Co—Cr-Al(Y)纳米涂层经1000,1100和1200℃氧化后Al2O3膜中的残余应力,获得如下结果: (1)残余应力随氧化温度升高而增大; (2)暂态氧化出现的区域应力值明显低于无暂态氧化的区域; (3)两种涂层1000℃下形成的氧化膜中的残余应力相差不大,但在1100和1200℃下,含Y涂层形成的氧化膜中的残余应力比不含Y中的高.对实验结果进行了分析.
The residual stress in Al2O3 film after magnetron sputtering Co-Cr-Al (Y) nano-coating was oxidized at 1000, 1100 and 1200 ℃ was measured by photoexcitation fluorescence spectroscopy. The following results were obtained: (1) (2) the regional stress value of transient oxidation is obviously lower than that of the region without transient oxidation; (3) the residual stress in the oxide film formed by the two coatings at 1000 ℃ is not much different, However, at 1100 and 1200 ℃, the residual stress in the Y-coated oxide film is higher than that in the non-Y. The experimental results were analyzed.