等离子体发射光谱(OES)常用于等离子体薄膜沉积过程中气相物种及化学反应过程的诊断,它有助于对薄膜生长机理、沉积条件、薄膜结构及物性之间关系的了解.到目前为止,仍未见到有关氮碳薄膜反应溅射沉积过程的光谱诊断工作的报道,虽然已对薄膜生长的前驱物,如CN自由基、氮原子等气相物种进行了推测,但仍然缺乏有关的实验结果.从已报道的文献看,氮碳薄膜在物性上存在差异,如纳米显微力学硬度有的高达60GaP,有的只有几个GaP,类似于类金刚石薄膜其物性与碳的sp~3/sp~2键比例密切相关,氮碳薄膜的物性同样也与其多种价键结构类型相关,只是其类型相对要复杂的多,并且可以肯定地说,受沉积参数的影响.因此,光谱诊断实验和薄膜物性测量相结合有助于了解沉积参数与氮碳薄膜中各种价 Plasma emission spectroscopy (OES), commonly used in the diagnosis of gas phase species and chemical reaction processes during plasma film deposition, is useful for understanding the relationship between film growth mechanism, deposition conditions, film structure, and physical properties. Up to now, However, there is no report on the spectroscopic diagnosis of nitrogen-carbon thin film during reactive sputter deposition. Although the precursors of thin film growth, such as CN radicals and nitrogen atoms, have been speculated, the relevant experimental results are still lacking From the reported literature, there are some differences in the physical properties of nitrogen - carbon thin films, such as the nano - mechanical hardness of up to 60GaP, and some only a few GaP, similar to the diamond - like carbon film its physical properties and carbon sp ~ 3 / sp ~ 2 bond ratio is closely related to the physical properties of nitrogen-carbon thin film is also related to its variety of valence bond structure type, but its type is relatively more complex and can be said to be affected by the deposition parameters.So spectral diagnostic experiments and The combination of film property measurements helps to understand the deposition parameters and the various valences in the nitrocarburized film