随着亚微加工技术的需要,做为取代历来光刻的手段——电子束光刻的研究逐初兴盛起来。他正好和比光学显微镜的分辨率更高的电子显微镜相似,但由于使用目的不同,单把以前的电子显微镜技术应用到电子束曝光上是不够的。对于电子显微镜的极窄区域,对于尽量提 With the need of submicron processing technology, as a means to replace the traditional lithography - electron beam lithography research flourished. He happens to be similar to a higher-resolution electron microscope than an optical microscope, but due to different purposes, a single previous electron microscope technique was not enough for electron beam exposure. For the very narrow area of ​​electron microscope, to try to mention