描述了一种用单一掩蔽层的光刻剥离工艺制作亚微米薄膜图形和简单的多层结构的技术。此技术采用在衬底上的掩蔽层补偿及倾斜淀积薄膜的方法。它提供一个制作小面积的Josephson结和厚度变化的超导桥的简单方法。对于制作电路中的这类器件,此法也是适用的。作为例子,强调了它在超导技术中的应用,但是在其它领域里也可找到它的用途。 A technique for making submicron film patterns and simple multi-layer structures using a photolithographic lift-off process with a single masking layer is described. This technique uses a mask on the substrate to compensate and tilt the deposited film method. It provides a simple way to make small area Josephson junctions and thickness-varying superconducting bridges. This method is also suitable for the production of such devices in the circuit. As an example, its use in superconducting technology has been emphasized, but its use has also been found in other fields.