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TiO2 thin films were fabricated by RF magnetron sputtering on titanium substrates and then implanted with different amounts of carbon. The microstructure, valence states and optical characteristics of each sample were investigated by X-ray diffraction, X-ray photoelectron spectroscopy and UV-vis diffuse reflection spectroscopy. Photoelectric property was evaluated under visible light using a xenon lamp as illuminant. The experimental results indicate that the implanting carbon concentration has a significant infl uence on film’s micro structure and element valence states. The dominant valence states of carbon vary as carbon content increases. Carbon ion implantation remarkably enhances the current density and photocatalytic capability of TiO2 thin films. The optimized implanting content is 9.83×1017 ion/cm2, which gives rise to a 150% increased photocurrent and degradation rate.
The microstructure, valence states and optical characteristics of each sample were investigated by X-ray diffraction, X-ray photoelectron spectroscopy and UV-vis diffuse reflection spectroscopy. Photoelectric property was evaluated under visible light using a Xenon lamp as illuminant. The experimental results indicate that the implanting carbon concentration has a significant infl uence on film’s micro structure and element valence states. The dominant valence states of carbon vary as carbon content increases. Carbon ion implantation remarkably enhances the current density and photocatalytic capability of TiO2 thin films. The optimized implanting content is 9.83 × 1017 ion / cm2, which gives rise to a 150% increased photocurrent and degradation rate.