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描述了真空微电子荧光平板显示器件的工作原理,提出了采用反应离子刻蚀法制作大规模场致发射阵列的工艺,在动态真空系统中测定了荧光平板显示器件的场发射特性,并获得了结果。
The working principle of a vacuum microelectronic fluorescent flat panel display device is described. A process for making a large-scale field emission array by reactive ion etching is proposed. The field emission characteristics of the fluorescent flat panel display device are measured in a dynamic vacuum system and obtained result.