论文部分内容阅读
描述了真空微电子荧光平板显示器件的工作原理，提出了采用反应离子刻蚀法制作大规模场致发射阵列的工艺，在动态真空系统中测定了荧光平板显示器件的场发射特性，并获得了结果。
The working principle of a vacuum microelectronic fluorescent flat panel display device is described. A process for making a large-scale field emission array by reactive ion etching is proposed. The field emission characteristics of the fluorescent flat panel display device are measured in a dynamic vacuum system and obtained result.