从光学邻近效应产生机理出发，提出用带灰阶衬线的灰阶掩模实现光学邻近效应精细校正的新方法，并指出掩模图形振幅信息的优化，即合理分布掩模图形的空间频谱，可以改善空间像的光强分布并获得高质量的光刻图样。计算表明，校正后的成像图样与理想像的偏差小于０．９％。 Based on the mechanism of the optical proximity effect, a new method of finely correcting the optical proximity effect is proposed by using a grayscale mask with gray-line serifs. The optimization of the amplitude information of the mask pattern, that is, the rational distribution of the spatial spectrum of the mask pattern, Can improve the spatial distribution of light intensity and obtain high quality lithography patterns. Calculations show that the deviation of the corrected imaging pattern from the ideal is less than 0.9%.