论文部分内容阅读
本文以直流磁控溅射法制备的Au/Nicr薄膜为研究对象,采用扫描电镜(SEM)和扫描俄歇探针(SAM)分析了真空和大气环境下350℃20min热处理后,Au膜表面结构及化学组份的变化。
In this paper, Au / Nicr thin films prepared by direct current magnetron sputtering were studied. The surface structure of Au film was analyzed by scanning electron microscope (SEM) and scanning Auger probe (SAM) in vacuum and atmosphere at 350 ℃ for 20min. And changes in chemical composition.