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采用真空磁过滤弧沉积(FAD)的方法制备的类金刚石(DLC)薄膜具有良好的场发射性能。通过离子束技术和微细加工技术可以实现DLC薄膜的图形化并能大大提高薄膜的场发射性能。测试表明,DLC薄膜孔洞阵列具有很好的电子场发射性能,阈值电场达到了2.1V/μm,当场强为14.3V/μm时,电流密度达到了1.23mA/cm2。利用图形化的DLC薄膜作为阴极,设计和制作了矩阵选址单色场发射显示器(FED)样管。
Diamond-like carbon (DLC) films prepared by the vacuum magnetic filtration arc deposition (FAD) have good field emission properties. The DLC film can be patterned by ion beam technology and microfabrication technology and greatly improve the field emission performance of the film. The results show that the DLC film hole array has good electron field emission performance, the threshold electric field reaches 2.1V / μm, and the current density reaches 1.23mA / cm2 when the field intensity is 14.3V / μm. Using a patterned DLC film as a cathode, a matrix-aligned monochrome field emission display (FED) sample tube was designed and fabricated.