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本文报导了以钛酸丁酯((C_4H_9O)_4Ti)为反应源物质,采用等离子体化学气相淀积(P-CVD)技术,在不同衬底上淀积出性能良好的TiO_2薄膜材料,并对其结构和气敏特性进行了初步研究。
In this paper, TiO 2 thin film material deposited on different substrates by plasma chemical vapor deposition (P-CVD) using butyl titanate ((C_4H_9O) _4Ti) as reactant is reported. The structure and gas sensing properties of a preliminary study.