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在各种不同的气氛和温度下,以深紫外辐照聚甲基异丙烯基酮(PMIPK)抗蚀剂,研究其曝光特性。发现氧能影响PMIPK的灵敏度,以溶剂显影的灵敏度,在氧气流中明显地低于N_2气流中,并且这种影响随膜厚增加而减弱。温度对无定形聚合物的辐射化学产率的影响主要来自分子迁移率的变化。深紫外辐照下的灵敏度和反差表明有一定的温度效应,随温度上升灵敏度略有增加,而反差则有所降低。在给定的显影条件下,正性抗蚀剂的分辨率随原始和辐照抗蚀剂之间分子量分布的交盖增加而减小。深紫外辐照下PMIPK抗蚀剂分子量分布分散的原因有两个,一是抗蚀剂的横切面和整个辐照面光密度的不均匀性,二是拉开反应是导致降解的主要反应。本文还讨论了温度和膜厚对PMIPK的反差的影响。
Exposure to PMIPK was studied by deep UV irradiation at various atmospheres and temperatures. It was found that oxygen can affect the sensitivity of PMIPK to develop sensitivities in solvents that are significantly lower in the oxygen stream than in the N 2 gas stream and this effect diminishes as the film thickness increases. The effect of temperature on the radiation chemical yield of amorphous polymers mainly comes from the change of molecular mobility. Sensitivity and contrast under deep UV irradiation indicate a certain temperature effect, with a slight increase in sensitivity with temperature, and a decrease in contrast. Under given development conditions, the resolution of the positive resist diminishes as the cross-over of the molecular weight distribution between the original and irradiated resist increases. There are two reasons for the molecular weight distribution of PMIPK resist to disperse under deep ultraviolet radiation. One is the cross section of the resist and the non-uniformity of the optical density of the entire irradiated surface. The other is that the pull-out reaction is the main reaction leading to degradation. This article also discusses the effect of temperature and film thickness on PMIPK contrast.