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用同步辐射光源和光电离质谱研究了分子束中ArHClvanderWaals（vdW）团簇的光电离过程．测量结果表明，分子束中的ArHCl的浓匠与气源压力近似满足如下关系式：a（ArHCl）％＝179×10-8.首次给出了ArHCl团簇的光电高效率曲线，并测得ArHCl+的出现势为12.52±0.03eV。根据实验测量的HCl和ArHCl的电高能，计算出Ar－HCl+的解高能为022±0.03eV.用Gaussian－94w量化程序计算出解高能约为0.16eV.实验表明当团簇内的Ar电离时，ArHCl+质谱峰强度明显低于预计的强度，是由于体系电离后发生了电荷转移及解离过程．
The photoionization of ArHClvanderWaals (vdW) clusters in molecular beam was studied by using synchrotron radiation and photoionization mass spectrometry. The measurement results show that the concentration of ArHCl in the molecular beam and the pressure of the gas source approximately satisfy the following relation: a (ArHCl)% = 179 × 10-8. For the first time, the photoelectric high efficiency curve of ArHCl clusters is given and measured The appearance potential of ArHCl + was 12.52 ± 0.03eV. According to the experimentally measured energies of HCl and ArHCl, the solution energy of Ar-HCl + is calculated to be 022 ± 0.03eV. The solution energy of Gaussian-94w is calculated to be about 0.16eV. Experiments show that when the Ar ion in the cluster is ionized The intensity of ArHCl + was obviously lower than the expected intensity, which was due to charge transfer and dissociation after ionization.