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通过分析pH值对碱性抛光液抛光速率稳定性的影响,得出了碱性抛光液抛光速率相对稳定的pH值区间,并与酸性抛光液进行了对比,在酸性环境中至少稳定24 h,pH≤4时甚至可稳定6天。在碱性环境中pH为8时稳定性效果较好。研究得出了不同体积分数的螯合剂对碱性抛光液速率稳定性的影响,河北工业大学微电子所研制的螯合剂为多羟多胺有机碱,具有调节pH的作用。随螯合剂的体积分数逐渐增加,碱性抛光液抛光速率的稳定性逐渐变差,因此在研究碱性抛光液配比时应注意螯合剂的体积分数,以提高稳定性。观察和分析了碱性抛光液在全pH值范围内的速率稳定性变化,并将碱性抛光液的pH值调至7以下,在不产生凝胶的前提下观察其速率的稳定性。
By analyzing the effect of pH value on the polishing rate stability of alkaline polishing solution, the pH value range of the polishing rate of alkaline polishing solution was obtained. Compared with the acidic polishing solution, it was stable in acidic environment for at least 24 h, Even pH 6 can be stable for 6 days. In alkaline pH stability of 8 is better. The effect of chelating agent with different volume fraction on the stability of alkaline polishing solution was studied. The chelating agent developed by Microelectronics of Hebei University of Technology was polyhydroxy polyamine organic base with pH adjustment. With the gradual increase of the volume fraction of the chelating agent, the stability of the polishing rate of the alkaline polishing solution is gradually deteriorated. Therefore, the volume fraction of the chelating agent should be paid attention to in order to improve the stability of the alkaline polishing solution. The rate stability of alkaline polishing solution in the whole pH range was observed and analyzed. The pH value of alkaline polishing solution was adjusted to below 7, and the stability of the rate was observed without gel formation.