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1982年10月27日至11月1日在常州市举行了由中国电子学会生产技术学会,半导体与集成技术学会联合召开的第二届全国电子束、离子束、光子束学术年会。参加这次学术年会的有全国大专院校、研究所、工厂等单位的科技人员代表282名。会议分成电子束曝光、抗蚀剂及刻蚀工艺、离子注入设备、离子注入技术、激光退火及X射线和远紫外曝光、离子刻蚀与溅射等六个小组进行学术交流。会上共宣读了174篇论文,另有51
October 27, 1982 to November 1, held in Changzhou City, China Institute of Electronics, Institute of Production Technology, Semiconductor and Integrated Technology Society jointly held the second session of the national electron beam, ion beam, photon beam academic annual meeting. There are 282 representatives of scientific and technical personnel from colleges, institutes, factories and other institutes participating in this academic conference. The conference was divided into six groups: electron beam exposure, resist and etching, ion implantation, ion implantation, laser annealing, X-ray and far UV exposure, ion etching and sputtering. A total of 174 papers were read and another 51 were read