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本文指出XeCl激光器钝化过程中激光器金属部件的氧化膜与HCl的反应是返潮现象的重要原因。分析了返潮现象对器件的危害及消除方法。
This paper points out that the reaction of oxide film and HCl in laser metal parts during laser passivation of XeCl laser is the important reason of the phenomenon of damp phenomenon. The damage of the damp phenomenon to the device and its elimination method are analyzed.