传统的半导体清洗工艺一直采用硫酸、盐酸、硝酸、双氧水、氢氧化铵、甲苯、丙酮、四氯化碳和三氯乙烯等化学试剂。这些试剂成本高,有腐蚀作用,有毒而污染。多年来国内外一直在研究无毒害中性清洗工艺。山东大学光电材料与器件研究所在完成“七五”攻关项目——TCO膜玻璃中性工艺研究中,为了能定 The traditional semiconductor cleaning process has been using sulfuric acid, hydrochloric acid, nitric acid, hydrogen peroxide, ammonium hydroxide, toluene, acetone, carbon tetrachloride and trichlorethylene and other chemical reagents. These reagents are costly, corrosive, toxic and contaminated. Over the years both at home and abroad have been studying non-toxic neutral cleaning process. Institute of optoelectronic materials and Devices, Shandong University in the completion of the “Seventh Five-Year” research project - TCO membrane glass neutral technology research, in order to be able to