论文部分内容阅读
,A novel anti-shock silicon etching apparatus for solving diaphragm release problems
【机 构】
:
Key Laboratory of Microelectronics Devices & Integrated Technology,Institute of Microelectronics,Chi
【出 处】
:
中国物理B(英文版)
【发表日期】
:
2010年6期
其他文献
,Nonlinear two-mode squeezing obtained by analysing two-mode exponential quadrature operators in ent
So far, Lou’s direct perturbation method has been applied successfully to solve the nonlinear Schrōdinger equa-tion(NLSE) hierarchy, such as the NLSE, the cou
,Effect of F doping on capacitance-voltage characteristics of SiCOH low-k films metal-insulator-semi
,The electrical characteristics of a 4H-silicon carbide metal-insulator-semiconductor structure with
,Turbulence-induced changes in degree of polarization, degree of coherence and spectrum of partially