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研究了用射频磁控溅射方法制备的［Ｃｏ（１５ｎｍ）／Ｖ（ｄＶ）］２０（０５ｎｍ≤ｄＶ≤４ｎｍ）多层膜的结构和磁性．用Ｘ射线衍射、透射电子显微镜、高分辨率透射电子显微镜等手段对其结构的分析，表明它们层状周期结构良好，沿膜的生长方向具有ｆｃＣｏ（１１１）和ｂｃｃＶ（１１０）织构，且是由小的柱状晶粒构成的多晶薄膜．界面一定程度的合金化，使其成为成分调制周期结构，也是它们的一个结构特征．由其铁磁共振谱计算得到较小的ｇ因子和４πＭｅｆ值，表明多层膜界面存在一定程度的合金化．对于Ｖ层厚度小于２２ｎｍ的多层膜，观测到自旋波共振谱，并作了分析．计算了层间耦合常数，说明Ｃｏ层之间存在较弱的层间交换耦合作用．
The structure and magnetic properties of [Co (15nm) / V (dV)] 20 (05nm≤dV≤4nm) multilayers fabricated by RF magnetron sputtering were investigated. The analysis of their structures by X-ray diffraction, transmission electron microscopy and high-resolution transmission electron microscopy showed that they have well layered periodic structures with fcCo (111) and bccV (110) textures along the growth direction of the film Is a polycrystalline thin film composed of small columnar grains. A certain degree of alloying of the interface makes it a component modulation periodic structure, which is also a structural feature of them. The smaller g-factor and 4πMef values were calculated from their ferromagnetic resonance spectra, indicating that there is some degree of alloying at the multi-layer interface. For multilayers with V layer thickness less than 2 2 nm, the spin wave resonance spectrum was observed and analyzed. The interlayer coupling constants are calculated, indicating that there is weak interlayer exchange coupling between Co layers.