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所谓的亚微米光刻技术,是一种光刻技术诀窍;它运用技巧使得在半导体上印制的图形的最小尺寸比光刻所用的光源的波长还要短。多年来一直具有一些神秘的色彩,早就为众多的人们所熟知,但是在实验室实行起来却很困难。现在,有希望发展成为一种大有前途的工业生产技术;并且显示:有可能将现有的,用来处理0.25微米的专用设备的使用寿命大大延长;并有希望提高改进,成为0.12微米工艺,或更小尺寸工艺所用的生产设备. Numerical Technologies公司(位于美国加州的San Jose)开发的软件,可以使当前必须用人工来进行的调整工作实现自动化。该公司为硅加工制造工厂开发了两套不同的软件包;一种用于相移光刻技术,称为Subwavelength N-abled Process;另一种称为OPC,用于光学接近校准光刻技术。调整、校准工作在版图设
The so-called sub-micron photolithography technique is a photolithographic technique; it employs the technique of making the minimum size of the printed image on the semiconductor shorter than the wavelength of the light source used in lithography. Has been a mysterious color for many years, has long been known to many people, but it is very difficult to implement in the laboratory. Now there is hope of developing into a promising industrial production technology; and it has been shown that it is possible to significantly extend the useful life of the existing specialized equipment for processing 0.25 microns; and hopefully, improvements will be made to the 0.12 micron process , Or smaller-scale manufacturing equipment Numerical Software Inc. (San Jose, CA) developed software that can automate the tweaks that currently must be done manually. The company has developed two different software packages for the silicon fabrication facility; one for phase shift lithography, called the Subwavelength N-abled Process, and the other for OPC, for optical proximity calibration lithography. Adjustment, calibration work in the layout