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A numerical model is established to simulate the concentration field in irregular lamel- lar eutectic of Al-Si system. Both the undercooling and spacing are dependent on the growth rate and the temperature gradient, and increasing growth rate causes an in- crease of undercooling but a decrease of lamellar spacing, while increasing temperature gradient Leads to a decrease of Lamellar spacing. The computed results are in good agreement with experimental observations.
A numerical model is established to simulate the concentration field in irregular lamellaeutectic of Al-Si system. Both the undercooling and spacing are dependent on the growth rate and the temperature gradient, and increasing growth rate causes an in- crease of undercooling but a decrease of lamellar spacing, while increasing temperature gradient leads to a decrease of Lamellar spacing. The computed results are in good agreement with experimental observations.