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本文指出光刻胶所记录到的是浮雕型相位光栅，经历了电铸、模压转移到ＰＥＴ薄膜上，在此过程中光栅刻蚀深度的转移是非线性的，即深度浅的地方，其最后结果将更浅，甚至丢失。由于散射物体散斑的光强分布是严重不均匀的，故光刻胶上记录下各散斑的光栅刻蚀深度也严重不均匀，经过电铸、模压后，进一步加重了这种不均匀性，使得模压片的衍射效率降低，解决的办法是尽可能地使各个散斑上的光栅刻蚀深度趋于均匀化。
This paper points out that the photoresists recorded the embossed phase grating, which has undergone electroforming and mold transfer to the PET film. During this process, the transfer of the grating etching depth is nonlinear, that is, the depth is shallow, and the final result Will be shallower, even lost. Since the light intensity distribution of the speckle of the scattering object is seriously non-uniform, the depth of the grating etching of each speckle recorded on the photoresist is also seriously non-uniform. This nonuniformity is further aggravated after electroforming and molding , So that the diffraction efficiency of the molded piece is reduced, the solution is to make the grating on each speckle etching depth tends to be uniform.