Photocatalytic Activities of Amorphous TiO_2-Cr Thin Films Prepared by Magnetron Sputtering

来源 :Journal of Wuhan University of Technology(Materials Science | 被引量 : 0次 | 上传用户:liongliong425
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Chrome-doped titanium oxide films were prepared by reactive magnetron sput-tering method. The films deposited on glass slides at room temperature were investigated by atom force microscope, X-ray diffractometer, X-ray photoelectron spect roscopy ,UV-Vis spectrophotometer, the photoluminescence (PL) and ellipse polarization apparatus. The results indicate that TiO2-Cr film ex-ists in the form of amorphous. The prepared films possess a band gap of less than 3.20 eV, and a new absorption peak. The films, irradiated for 5 h under UV light, exhibit excellent photocatalytic activities with the optimum decomposition rate at 98.5% for methylene blue. Consequently, the thickness threshold on these films is 114 nm, at which the rate of photodegradation is 95% in 5 h. When the thickness is over 114 nm, the rate of photodegradation becomes stable. This result is completely dif-ferent from that of crystalloid TiO2 thin film. Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering-tering method. The films deposited on glass slides at room temperature were investigated by atom force microscope, X-ray diffractometer, X-ray photoelectron spectoscopy, UV-Vis spectrophotometer, the The results indicate that TiO2-Cr film ex-ists in the form of amorphous. The prepared films possess a band gap of less than 3.20 eV, and a new absorption peak. The films, irradiated for The thickness of the film is 114 nm, at which the rate of photodegradation is 95% in 5 h. When the thickness of the photocatalytic activity with the optimum decomposition rate at 98.5% for methylene blue. is over 114 nm, the rate of photodegradation becomes stable. This result is completely dif-ferent from that of crystalloid TiO2 thin film.
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