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在掺铌钛酸锶(NST)的衬底上,通过加入抑制开裂剂聚乙二醇对异辛基苯基醚(triton X-100),利用溶胶-凝胶法制备了厚达4.6μm的锆钛酸铅镧(PLZT)薄膜,从而有效地减小了其在集成光学器件应用中的传输损耗。实验分析了triton X-100的加入量对薄膜质量的影响,并通过优化triton X-100的加入量可有效抑制薄膜开裂。利用光学显微镜、扫描电子显微镜(SEM)、X射线衍射仪(XRD)、棱镜耦合波导测试仪和台阶仪等对制备的薄膜性能进行分析。结果表明,经过650℃快速退火处理后,得到了表面平整度小于30nm、粒径为50~100nm的钙钛矿结构PLZT薄膜,测得PLZT(8/65/35)和PLZT(11/65/35)薄膜在1 550nm波长处的折射率分别为2.4029和2.388 5。本文方法制备的薄膜可以用于PLZT电光器件的制作。
On the substrate doped with niobium-niobate strontium titanate (NST), the anti-cracking agent triton X-100 was prepared by sol-gel method, Lead lanthanum zirconate titanate (PLZT) film, thereby effectively reducing the transmission loss in the application of integrated optics. The effects of the addition amount of triton X-100 on the quality of the film were analyzed experimentally, and the cracking of the film was effectively suppressed by optimizing the amount of triton X-100 added. The prepared films were characterized by optical microscopy, scanning electron microscopy (SEM), X-ray diffraction (XRD), prism-coupled waveguide tester and stepper. The results show that PLZT (8/65/35) and PLZT (11/65/35) films with perovskite structure with surface flatness less than 30 nm and particle size of 50 ~ 100 nm were obtained after rapid annealing at 650 ℃. 35) The refractive index of the film at a wavelength of 1550 nm is 2.4029 and 2.388 5, respectively. The thin film prepared by this method can be used in the fabrication of PLZT electro-optical device.