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利用射频磁控溅射技术在有机玻璃表面上一次完成表面活化、ITO膜制备、SiO2 减反射膜制备过程。利用低能等离子体对有机玻璃表面进行改性以提高ITO膜的附着力。研究了氧分压等工艺参数对ITO膜导电性能及光学性能的影响。
Using RF magnetron sputtering technique, surface activation, ITO film preparation and SiO2 anti-reflection film preparation were completed on the surface of organic glass. The surface of plexiglass is modified by low energy plasma to improve the adhesion of ITO film. The effects of oxygen partial pressure and other parameters on the electrical and optical properties of ITO films were investigated.