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采用非平衡磁控溅射方法在AZ31镁合金表面沉积Mg-Cu-Y薄膜,以纯铜和Mg65Cu25Y10合金作为溅射靶材,选则Mg65Cu25Y10单靶、Mg65Cu25Y10靶和铜靶双靶两种方式分别进行溅射沉积。利用XRD、AFM、SEM分析了膜层结构与表面形貌,纳米压痕法、球盘式摩擦磨损测试研究了膜层的硬度和耐磨性。结果表明,Mg65Cu25Y10单靶溅射得到的薄膜为完全非晶态结构,而双靶共溅获得的膜层中出现含有铜的晶态组织。随着膜层中Cu含量的增加,纳米硬度较非晶态膜层有所降低,但同时耐磨性提高。两类不同结构薄膜相比较,Mg65Cu25Y10单靶溅射沉积的非晶膜层硬度最高,达到12GPa。用磨损量评价了基体与膜层的耐磨性,包含Cu结晶相的双靶共溅薄膜具有较好的耐磨性能。
Mg-Cu-Y thin film was deposited on the surface of AZ31 magnesium alloy by unbalanced magnetron sputtering. Pure copper and Mg65Cu25Y10 alloy were selected as sputtering targets. Mg65Cu25Y10 single target, Mg65Cu25Y10 single target and copper target double target were selected respectively. Sputtering deposition. The hardness and wear resistance of the film were studied by XRD, AFM and SEM. The film structure and surface morphology, nanoindentation method and ball-and-disc friction and wear test were studied. The results show that Mg65Cu25Y10 single target sputtering film is completely amorphous structure, and double target co-sputtering obtained in the film containing copper crystal structure. With the increase of Cu content in the film, the nano-hardness is lower than the non-crystalline film, but at the same time the wear resistance is improved. Compared with two kinds of different structure films, Mg65Cu25Y10 single-target sputtered amorphous film has the highest hardness of 12GPa. The abrasion resistance was used to evaluate the wear resistance of the matrix and the film. The dual target co-sputtering film containing Cu crystal phase had better wear resistance.