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利用聚焦离子束刻蚀方法和电子束制版结合干法刻蚀方法制备了二维近红外波段光子晶体,发现两种方法都可以制备出均匀的二维光子晶体,聚焦离子束方法操作简单,电子束制版结合干法刻蚀方法操作步骤复杂.光谱测试表明,利用聚焦离子束方法在有源材料上刻蚀的光子晶体不发光,而电子束制版结合干法刻蚀方法制备的小晶格常数光子晶体即使有些无序,其出光效率也提高到没有光子晶体时的两倍.对两种方法所加工的光子晶体不发光和提高出光效率的机理进行了分析.
The two-dimensional near-infrared photonic crystal was prepared by focused ion beam lithography and electron beam lithography combined with dry etching. It was found that both methods can produce uniform two-dimensional photonic crystals. The focused ion beam method has the advantages of simple operation, The beam platemaking combined with the dry etching method is complicated in operation steps, and the spectral tests show that the photonic crystals etched on the active material by the focused ion beam method do not emit light, while the electron beam platemaking combined with the small lattice constant prepared by the dry etching method Even if the photonic crystals are disordered, their light extraction efficiency is also increased to twice that of the photonic crystals without photonic crystals. The photonic crystals processed by the two methods are not illuminated and the light extraction efficiency is improved.