日立中央研究所研制了极限分辨率为0.55μm 的10:1缩小投影曝光装置。过去研制成的RA-101型10:1缩小投影曝光装置,使用波长为436nm 的 g 线,极限分辨率为1.5～1.0μm。而这次研制的装置,使用波长为365nm 的 i 线,提高了分辨率极限。光源仍用过去的500W 高压水银灯,这个灯的发光光谱在365nm 很强。透镜是美国トロパル公司制造的,数值孔径为0.4。从掩模到片子的距离为400nm,焦深为±1μm,分辨率为0.6μm 时 MTF(调制传递函 Hitachi Central Research Institute has developed a limit resolution of 0.55μm 10: 1 reduction projection exposure device. In the past, the RA-101 10: 1 reduction projection exposure apparatus was developed using a g-line with a wavelength of 436 nm and a limit resolution of 1.5 to 1.0 μm. The device developed this time, using a wavelength of 365nm i line, increased resolution limit. The light source is still used in the past 500W high pressure mercury lamp, the light emission spectrum of this lamp is very strong at 365nm. Lens is made by the United States Tromol Company, the numerical aperture of 0.4. The distance from the mask to the film is 400 nm, the depth of focus is ± 1 μm, and the resolution is 0.6 μm MTF (Modulation Transfer Function