Fabrication and characterization of implantable silicon neural probe with microfluidic channels

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In this paper,a silicon-based neural probe with microfluidic channels was developed and evaluated.The probe can deliver chemicals or drugs to the target neurons while simultaneously recording the electrical action of these neurons extracellularly.The probe was fabricated by double-sided deep reactive ion etching(DRIE) from a silicon-on-insulator(SOI) wafer.The flu-idic channels were formed with V-shape groove etching on the silicon probe and sealed with silicon nitride and parylene-C.The shank of the probe is 4 mm long and 120 μm wide.The thickness of the probe is 100 μm.The probe has two fluidic chan-nels and two recording sites.The microfluidic channels can withstand a pressure drop as much as 30 kPa and the flow resistiv-ity of the microfluidic channel is 0.13 μL min-1 kPa-1.The typical impedance of the neural electrode is 32.3 kΩ at 1 kHz at room temperature. In this paper, a silicon-based neural probe with microfluidic channels was developed and evaluated.The probe can deliver chemicals or drugs to the target neurons while simultaneously recording the electrical action of these neurons extracellularly. The probe was fabricated by double-sided deep reactive ion etching (DRIE) from a silicon-on-insulator (SOI) wafer. The flu-idic channels were formed with V-shape groove etching on the silicon probe and sealed with silicon nitride and parylene-C. The shank of the probe is 4 mm long and 120 μm wide.The thickness of the probe is 100 μm.The probe has two fluidic chan-nels and two recording sites.The microfluidic channels can withstand a pressure drop as much as 30 kPa and the flow resistiv- ity of the microfluidic channel is 0.13 μL min-1 kPa-1.The typical impedance of the neural electrode is 32.3 kΩ at 1 kHz at room temperature.
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