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实验研究了离子注入对多晶银薄膜晶体结构及表面成份的影响。在室温环境下,将能量为24keV的N~+离子和350keV的Xe~+离子以不同的注入剂量注入到多晶银薄膜中。对离子注入前后的银薄膜样品进行了透射电子显微镜(TEM)观察和X射线光电子能谱(XPS)及俄歇电子能谱(AES)分析。经分析发现,离子注入后在银薄膜中出现了再结晶和晶粒长大现象,而且晶粒尺寸随注入离子的剂量增加而增加。当注入的N~+离子剂量≥1.3×10~(17)Ions/cm~2及注入的Xe~+离子剂量达到3×10~(16)Ions/cm~2时,多晶银膜转变成单晶银薄膜。本文对实验结果进行了讨论。
The effects of ion implantation on the crystal structure and surface composition of polycrystalline silver thin films were experimentally studied. At room temperature, N ~ + ions with energy of 24 keV and Xe ~ + ions with wavelength of 350 keV were implanted into polycrystalline silver films with different implantation doses. Transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) analyzes of the silver thin films before and after ion implantation were carried out. The analysis shows that recrystallization and grain growth occur in the silver thin film after ion implantation, and the grain size increases with the dose of implanting ions. The polycrystalline silver film was transformed into the ion-doped polycrystalline silver film when the dose of N ~ + ions was more than 1.3 × 10 ~ (17) Ions / cm ~ 2 and the dose of Xe ~ + ions was 3 × 10 ~ (16) Ions / Single crystal silver film. This paper discusses the experimental results.