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本文采用XRD相定量法测定了NiO和MgO在Al_2O_3表面的单层分散容量,并研究甲烷化催化剂中添加剂MgO和La_2O_3对NiO分散容量的影响。用H_2还原法研究Ai_2O_3表面上的NiO的还原性能,以及添加剂对NiO还原性能和还原后Ni晶粒大小的影响。试验结果表明,单层分散的NiO要比晶相NiO难还原。适量的MgO和La_2O_3能增加NiO在Al_2O_3上的单层分散容量,并使还原得到的Ni晶粒变小。但MgO的加入量过高会降低NiO的还原度。
In this paper, the monolayer dispersion capacity of NiO and MgO on the surface of Al 2 O 3 was determined by XRD quantitative method. The effects of additives MgO and La 2 O 3 on the dispersion capacity of NiO were studied. The reduction of NiO on the surface of Ai_2O_3 and the effect of additives on the reduction performance of NiO and the size of Ni after reduction were studied by H_2 reduction method. The experimental results show that single layer dispersed NiO is more difficult to reduce than crystalline NiO. The proper amount of MgO and La_2O_3 can increase the monolayer dispersion capacity of NiO on Al_2O_3 and decrease the size of the Ni grains reduced. However, excessive addition of MgO will reduce the reduction of NiO.