论文部分内容阅读
采用离子束溅射镀膜装置制备了一种新的材料组合Si/C多层膜 ,用于 30 4nm波段的正入射多层膜反射镜。并用软X射线反射率计测得其反射比最大值为 0 14。有效地抑制了 15 0nm处的二级衍射峰。
A new material combination Si / C multilayers was fabricated by ion beam sputter coating equipment, which was used for positive incident multilayer film mirrors with a wavelength of 30 4 nm. The maximum reflectance was measured using a soft X-ray reflectometer as 0 14. Effectively inhibit the second diffraction peak at 150 nm.