Development of a Hybrid Photopolymer for Stereolithography

来源 :武汉理工大学学报(材料科学版)英 | 被引量 : 0次 | 上传用户:wintry5
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New liquid free radical-cationic hybrid photopolymer, consisting of acrylate-based photocurable resin and epoxy-based photosensitive resin for stereolithography by UV laser was developed.The experiment results indicated that the hybrid photopolymer exhibits advantages of both the acrylate- based photosensitive resin and the epoxy- based photosensitive polymer contained in the hybrid system with relatively high photospeed and low linear shrinkage.Stereolithography parts without obvious distortion were built on the stereolithography apparatus HRPLAI from this hybrid resin successfully and efficiently.
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