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1.φ3″IC用硅抛光片φ3″IC用硅抛光片为市级科研项目。鉴定专家对上冶二厂新的无蜡抛光清洗工艺和硅片技术参数进行了评定,认为无蜡抛光工艺先进、制备的抛光片平整度高、翘曲度低、无白雾、无划痕,达到了市科委下达的指标要求。其中平整度和表面白雾等部分指标接近联邦德国瓦克公司硅抛光片标准。
1.φ3 “IC with silicon polishing sheet φ3” IC with silicon polishing film for the municipal scientific research projects. Appraisal experts evaluated the new wax-free polishing process and the technical parameters of silicon wafers in Shangye No.2 Plant. The wax-free polishing process is advanced. The prepared polishing pad has high flatness, low warpage, no white fog and no scratches , Reached the index issued by the Municipal Science and Technology Commission requirements. One flatness and surface fog and some other indicators close to the Federal Republic of Germany WACKER silicon polishing sheet standard.