本文给出了制备离子注入的规范参考样品（SRM）的方法。这将为离子注入设备及测试设备的检测和验证提供可靠的手段，规范参考样品应该是硅片，硅片经由特定的杂质，确定的能量和剂量注入，且其平均方块电阻和均匀性都有明确的说明。这里提到的规范阐明了许多协作组织的工作经验，同时回顾了已往的研究成果。并考虑来自注入机厂商和使用厂家的结果。最后给出了在工艺过程中对各种重要参数起关键作用的灵敏度曲线的制备方法。 This article presents a method for preparing a standard reference sample (SRM) for ion implantation. This will provide a reliable means for the detection and verification of ion implantation equipment and test equipment. The normative reference sample should be a silicon wafer that is implanted with a specific impurity, a defined energy and dose, and has an average square resistance and uniformity Clear description. The specifications mentioned here shed light on the work experience of many collaborating organizations and review of previous research. And consider the results from the injection machine manufacturer and the manufacturer. Finally, the method of preparing the sensitivity curve that plays a key role in the process of various important parameters is given.