【摘 要】
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Zn1-x Cdx O crystalthin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron sputtering technique. X-
【机 构】
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State Key Laboratory of silicon Materials, Zhejiang University, Hangzhou 310027“,”Institute of Semic
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Zn1-x Cdx O crystalthin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron sputtering technique. X-ray diffraction measurements show that the Zn1-x Cdx O films are of completely (002)-preferred orientation for x ≤ 0.6. For x = 0.8, the film is a mixture of ZnO hexagonal wurtzite crystals and CdO cubic crystals. For pure CdO, it is highly (200) preferential-oriented. Photoluminescence spectrum measurement shows that the Zn1-x Cdx O (x = 0.2) thin film has a redshift of 0.14 eV from that of ZnO reported previously.
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