以微波激励氙（Ｘｅ）发射的真空紫外（ＶＵＶ）光作光源，乙炔（Ｃ２Ｈ２）作反应气体，氮（Ｎ２）、氩（Ａｒ）和氢（Ｈ２）气为稀释气体，采用直接光化学汽相淀积（ＣＶＤ）工艺，在硅（Ｓｉ）、钼（Ｍｏ）及玻璃衬底上进行了类金刚石碳（ＤＬＣ）膜的淀积生长．通过光电子能谱（ＸＰＳ）和扫描电子显微镜（ＳＥＭ）的测试与观察，研究了在同样工艺条件下不同衬底材料对ＤＬＣ膜成膜初期碳原子的吸附、凝聚及成核过程．实验结果表明，不同的衬底材料淀积效果不同，钼的淀积效果较好，硅的较差．此外，不同的稀释气体对同一衬底材料亦有不同的淀积效果 (VE) light emitted by xenon (Xe) as a light source, acetylene (C2H2) as reaction gas, nitrogen (N2), argon (Ar) and hydrogen (H2) Deposition (CVD) process, a diamond-like carbon (DLC) film is deposited on silicon (Si), molybdenum (Mo) and glass substrates. The adsorption, cohesion and nucleation of carbon atoms on the DLC films during the initial stage of film formation were investigated by XPS and SEM under the same conditions. The experimental results show that the deposition efficiency of different substrate materials is different, the molybdenum deposition effect is better, the silicon is poor. In addition, different dilution gases also have different deposition effects on the same substrate material