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随着半导体器件向大规模、超高频、大功率的方向发展。对半导体制版相应提出了细线条的更高要求。为适应细线条的需要,必须提高照相乳剂的分辨率,乳剂层要求越薄越好,以减少光在乳剂层中的散射、反射等影响,因此希望进一步提高乳剂的光敏度。在细颗粒的要求下提高光敏度的关键在于寻求新的光学增感剂,增感剂不仅能使本身只感紫外光的乳剂扩大它的感色范围,同时能成倍或几十倍地提高乳剂的感光速度。根据各感光胶片厂的推荐和大力协助,我们对一些光学增感剂在超微粒干版中的应用做了初步试验,由于时间仓促,摸索不够,此小结是不成熟的,希望兄弟单位多加指正。
With the semiconductor devices to large-scale, ultra-high frequency, high-power direction. Corresponding to the semiconductor plate corresponding to the higher requirements of thin lines. In order to meet the needs of thin lines, we must improve the resolution of the photographic emulsion, the emulsion layer requirements as thin as possible to reduce light scattering in the emulsion layer, reflection and other effects, it is hoped to further improve the photosensitivity of the emulsion. The key to increasing photosensitivity at the fine particle level is to look for new optical sensitizers that not only increase the range of sensations of their own UV-sensitive emulsion but also multiply or multiply by a factor of a few Sensitivity of the emulsion. According to the photosensitive film factory's recommendation and assistance, we have done a preliminary experiment on the application of some optical sensitizers in the ultra-fine dry version. Due to the short period of time and the insufficient exploration, this summary is immature and we hope that the brothers will make more efforts .