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本文介绍一种可供聚焦离子束装置用的镓液态金属离子源。该离子源的亮度高、发射源尺寸极小、发射电流稳定、调节方便、没有气体负载,适用于各种超高真空装置,是进行微离子束技术和表面分析技术开发性研究的关键部件之一。
This paper presents a gallium metal source for use in focused ion beam devices. The high brightness of the ion source, the smallest emitter size, emission current stability, easy adjustment, no gas load, suitable for a variety of ultra-high vacuum device, is a key component of the development of micro-ion beam technology and surface analysis technology research one.