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PbS多晶膜化学淀积过程,直接关系到PbS元件的光电性能,是PbS器件制备的核心工艺。在PbS多晶膜形成的化学过程中,还伴随着其他化学反应发生。因而,除生成PbS多晶膜外,还产生其他一些化合物。如何控制其他化学反应进行的进程和程度是化学淀积PbS多晶膜工艺极为重要的任务之一。一、NaOH、Pb(CH_3COO)_2及(NH_2)_2CS溶解过程NaOH、Pb(CH_3GOO)_2及(NH_2)_2CS是高温法化学淀积PbS多晶膜的三种试剂。这三种化合物在淀积PbS多晶膜前均需溶解于水中。1.NaOH的存放和溶解
PbS polycrystalline film chemical deposition process is directly related to the photoelectric properties of PbS devices, is the core of PbS device manufacturing process. In the formation of PbS polycrystalline film chemical process, along with other chemical reactions. Thus, in addition to the formation of PbS polycrystalline film, but also produce other compounds. How to control the progress and extent of other chemical reactions is one of the most important tasks in the chemical deposition of PbS polycrystalline films. First, the NaOH, Pb (CH 3 COO) 2 and (NH 2) 2 CS dissolution process NaOH, Pb (CH 3 GOO) 2 and (NH 2) _2 CS are the three reagents for the high temperature chemical deposition of PbS polycrystalline films. All three compounds need to be dissolved in water prior to depositing the PbS polycrystalline film. 1.NaOH storage and dissolution