中国科学院上海光学精密机械研究所研制的“扫描式投影光刻机”于一九八五年八月廿一日通过了由上海市科委和中科院上海分院联合组织的鉴定。上海光学精密机械研究所采用的是反射式1:1成像镜头,像区为一弧形狭带,通过掩模和硅片同步扫描;使整个硅片曝光。 经专家们鉴定,确认该机的主要技术指标为 最大硅片尺寸 φ75; 光刻分辨率 全片均匀光刻实用线宽为3μm(胶厚 1～1.8μm),目视分辨率为1.5μm; 套刻精度 <1μm; 狭缝照明均匀性 ±5％; 焦深 1.5μm。 扫描式投影光刻机的研制成功,为我国大规模集成电路专用设备填补了一项空白。待 The “scanning projection lithography machine” developed by the Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, passed the appraisal jointly organized by Shanghai Municipal Science and Technology Commission and Shanghai Branch of the Chinese Academy of Sciences on August 21, Shanghai Institute of Optics and Precision Mechanics is the use of reflective 1: 1 imaging lens, like the area as an arc-shaped tape, synchronous scanning through the mask and silicon; so that the entire silicon exposure. The experts identified that the main technical indicators of the machine for the largest silicon size φ75; photolithographic resolution uniform photolithography practical line width of 3μm (plastic thickness of 1 ~ 1.8μm), the visual resolution of 1.5μm; Coverage accuracy <1μm; Slit illumination uniformity ± 5%; Depth of focus 1.5μm. The success of the development of scanning projection lithography machine for China’s large-scale integrated circuits dedicated equipment to fill a gap. Wait