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研究电流密度对ZL108合金微弧氧化膜性能的影响,对ZL108合金进行了不同电流密度的微弧氧化处理。利用扫描电镜观察了不同电流密度下氧化膜表面形貌,采用电化学工作站测定了极化曲线,推导了氧化膜厚度计算公式。结果表明,随着电流密度增加,氧化电压增加变快,膜厚和硬度呈线性增加;氧化膜表面由致密变得多孔,同时出现裂纹;耐蚀性与氧化电流密度没有线性关系,在电流密度为6A/dm2时最好;氧化膜厚度可用L=(S(K log(t+t0)+A))/Iρ-(SR电解液)/ρ估算。
The effect of current density on the performance of ZL108 alloy micro-arc oxidation film was investigated. The micro-arc oxidation treatment of ZL108 alloy at different current density was carried out. Scanning electron microscopy was used to observe the surface morphology of oxide films at different current densities. The polarization curves were measured by electrochemical workstation, and the formula of oxide film thickness was deduced. The results show that as the current density increases, the oxidation voltage increases rapidly and the film thickness and hardness increase linearly. The surface of the oxide film becomes dense and becomes porous with cracks. The corrosion resistance has no linear relationship with the oxidation current density. Is best at 6A / dm2; the oxide film thickness can be estimated by L = (S (K log (t + t0) + A)) / Iρ- (SR electrolyte) / ρ.