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应用大气压等离子体射流化学方法加工高精度无损伤的光学表面越来越受到重视,而加工过程中去除函数是提高面型精度的关键因素之一.基于大气压等离子体加工的化学反应本质,根据化学动力学原理分析了活性氟原子浓度分布和温度场分布对去除函数轮廓的影响,建立了去除函数模型.该模型将活性氟原子浓度转换为采用发射光谱技术测量得到的活性氟原子光谱强度作为输入参数.将测得的光谱强度分布和温度场与加工轮廓对比,结果表明活性氟原子和温度场分布与去除函数轮廓有很大相关性,验证了所建立模型的可行性.该模型为研究去除函数形成机理和大气压等离子发生器设计奠定了基础.
The application of atmospheric pressure plasma jet chemical method to process high-precision non-destructive optical surface has drawn more and more attention, and the removal function is one of the key factors to improve the surface accuracy.According to the chemical reaction nature of atmospheric plasma processing, The kinetic principle analyzes the influence of active fluorine atom concentration distribution and temperature field distribution on the removal function profile and establishes a removal function model which converts the active fluorine atom concentration into the spectral intensity of active fluorine atom measured by emission spectroscopy as input The results show that the distribution of active fluorine atoms and temperature field have a great correlation with the contour of the removal function, which verifies the feasibility of the established model. Function formation mechanism and atmospheric pressure plasma generator design laid the foundation.