据《Electronic News》周刊报导,日本尼康公司和佳能公司都在为实现新型微光刻照明系统,以使i线步进机不采用移相掩模就能生产64兆位DRAM而进行着激烈竞争。 该两公司的研究人员正在研究对常规i线步进机照明系统进行控制,从而使步进机分辨率和焦深均得到改善的类似技术。如获成功,他们就能将现行i线光刻设备的实用范围有效地扩展到长期被看成是远紫外或其他极难驾驭的技术所属领域的一代产品。 According to the weekly Electronic News, both Japan’s Nikon and Canon are fiercely competing to implement a new microlithographic lighting system that will enable i-line steppers to produce 64 megabit DRAM without the use of phase-shift masks . Researchers at the two companies are studying similar technologies that control the conventional i-line stepper lighting system to improve stepper resolution and depth of focus. If successful, they can effectively extend the useful range of current i-line lithography equipment to the generation of products that have long been considered as far UV or other extremely difficult technologies.