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本文用碱式甲酸铍为源,在源区温度250—330℃,沉积区温度440—650℃的条件下,利用热解CVD方法制得了BeO薄膜,并对BeO 薄膜的物理和化学性能做了测量和试验.
In this paper, beryllium formate was used as a source, BeO thin films were prepared by pyrolysis CVD under the conditions of source temperature of 250-330 ℃ and deposition temperature of 440-650 ℃. The physical and chemical properties of BeO films were also studied Measurement and testing.