193nm光学薄膜是 10 0nm步进扫描光刻机系统中主要用到的光学薄膜。分析了膜料光学常数的不确定性、高折射率膜材料消光系数、水吸收以及膜层表面粗糙度对薄膜光学性能的影响。结果表明 ,要镀制出反射率大于98 5 %的高反膜 ,必须将高折射率材料的消光系数k控制在 0 0 0 34以内 ,同时膜层表面的粗糙度σ控制在 1nm以内。膜层性能同时还受其使用环境中水气含量及其水气中杂质含量的影响 ,要减少膜层水吸收的影响 ,就必须提高薄膜的致密度 ,采用离子成膜技术 ,或者改变膜层的使用环境。在考虑相关因素的前提下 ,设计了在光刻机曝光系统中主要用到的增透膜、高反膜 ,并分析了其实际性能与设计结果存在差别的原因 The 193nm optical film is the main optical film used in a 10 0nm step-and-scan lithography system. The influences of the uncertainty of the optical constants of the film, the extinction coefficient of the high refractive index film, the water absorption and the surface roughness of the film on the optical properties of the film were analyzed. The results show that the extinction coefficient k of high refractive index material must be controlled within 0 0 0 34, and the surface roughness σ of the film should be controlled within 1 nm. Film performance is also affected by the water vapor content and the impurity content of the water vapor in the environment. To reduce the influence of film water absorption, it is necessary to increase the density of the film, to use ion film forming technology, or to change the film layer The use of the environment. Under the premise of considering the related factors, the AR coating and high reflection film, which are mainly used in the exposure system of the lithography machine, are designed and the reasons for the difference between the actual performance and the design result are analyzed