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由北京有色金属研究总院承担的“直径200mm硅单晶抛光片高技术产业化示范工程”项目2003年12月19日通过国家验收。该项目是北京有色金属研究总院利用自主知识产权技术,集几十年来在硅材料领域的研究成果和产业化经验,在8英寸硅单晶抛光片技术开发和5英寸、6英寸硅单晶抛光片产业化技术基础上,进一步提高产业化水平,形成了年产8英寸硅单晶抛光片6000万平方英寸的生产能力的生产线。也是我国目前建设成功的第一条可满足0.25μm线宽集成电路需求的8英寸硅单晶抛光片生产线。
The project “High-tech Industrialization of Diameter 200mm Silicon Single Crystal Polishing Piece” project undertaken by Beijing Nonferrous Metal Research Institute passed the national acceptance on December 19, The project is the Beijing Nonferrous Metal Research Institute using proprietary intellectual property technology, set decades of silicon materials in the field of research and industrialization experience in the development of 8-inch silicon single crystal polishing technology and 5-inch, 6-inch silicon single crystal Based on the industrialization of polishing plates, the industrialization level will be further raised and a production line with an annual output of 60 million square inches of 8-inch silicon single crystal polishing discs has been formed. It is also the first 8-inch silicon single crystal polishing wafer production line that can meet the demand of 0.25μm linewidth IC in our country.