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随着现代高科技的发展,探测技术和手段也越来越进步,对隐身技术的要求也越来越高。常规的隐身技术主要是采用电磁损耗材科,这类材料一方面受质量、面密度等的影响,另一方面这类材料对电磁波的损耗也是有限的。故新的隐身机理研究是研究新型隐身技术发展的必然趋势。介绍等离子体隐身技术的研究现状,及目前等离子体隐身技术存在的问题。
With the development of modern high-tech, exploration technology and means are also more and more advanced, and the requirements for stealth technology are also getting higher and higher. Conventional stealth technology is mainly the use of electromagnetic loss materials, such materials on the one hand by the quality, surface density and other effects, on the other hand, such materials on the electromagnetic wave loss is limited. Therefore, the new stealth mechanism is to study the development of new stealth technology inevitable trend. The research status of plasma stealth technology is introduced, and the existing problems of plasma stealth technology are introduced.