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在半导体和电子元器件的生产行业中,玻璃基片的清洗是重要的工艺技术之一。以往常用的工艺多是采用酸性或碱性洗液,不仅洗涤效果不理想,而且易造成腐蚀、产生环境污染等。制备大面积透明导电膜,对玻璃基片的清洗工艺要求很高,研究设计新的清洗工艺是“七五”攻关课题的一部分。经过两年多的努力,物理系半导体研究室的同志们研究设计出了 TCO 膜玻璃基片中性清洗工艺。该工艺采用特制的 DZ—1、DZ—2
In the semiconductor and electronic components manufacturing industry, the cleaning of glass substrates is one of the important process technologies. In the past commonly used technology is the use of acidic or alkaline lotion, not only the washing effect is not ideal, but also easy to cause corrosion, resulting in environmental pollution. Preparation of a large area of transparent conductive film, the glass substrate cleaning process demanding, research and design of new cleaning process is “Seventh Five-Year” part of the key issues. After more than two years of hard work, the comrades in the Department of Physics, Semiconductor Research Laboratory, designed a TCO film glass substrate neutral cleaning process. The process uses a special DZ-1, DZ-2