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采用低压等离子体化学气相沉积方法(LPPCVD),以反式二丁烯(T2B)和氢气(H2)为工作气体,利用间歇跳动模式在微球表面制备30μm厚a-C:H涂层.利用原子力显微镜(AFM)和X射线照相技术对涂层表面形貌及壁厚均匀性进行表征,结果表明:随占空比减小,制备出的微球a-C:H薄膜表面粗糙度呈下降趋势,而壁厚均匀性随占空比的减小变化不明显;当占空比为1/5时,在直径为(280±50)μm的聚乙烯醇-聚苯乙烯(PVA-PS)双层球表面制备出30μm厚的a-C:H涂层,表面均方根粗糙度(RMS)低于30 nm;占空比为1/7时,不能维持微球的稳定跳动.
A 30 μm thick aC: H coating was prepared on the surface of the microspheres by the intermittent beating mode by using low pressure plasma chemical vapor deposition (LPPCVD) with the working gas of trans-dibutylene (T2B) and hydrogen (H2) (AFM) and X-ray radiography were used to characterize the coating surface morphology and wall thickness uniformity. The results show that the surface roughness of aC: H thin film decreases with increasing duty cycle, When the duty ratio is 1/5, the thickness uniformity is not obvious with the decreasing of the duty cycle. When the duty cycle is 1/5, the surface of the PVA-PS bilayer sphere with a diameter of (280 ± 50) μm The aC: H coating with a thickness of 30μm was fabricated. The root mean square roughness (RMS) of the aC: H coating was less than 30 nm. When the duty cycle was 1/7, the microstructure was not stable.