论文部分内容阅读
研制了一台具有二级透镜的聚焦离子束（ＦＩＢ）装置。它利用液态金属离子源：镓和金硅合金。离子束束斑在０．３μｍ左右，最小束斑达０．２１μｍ。能稳定、长时间地运行。文中论述了该系统的总体结构，对聚焦离子束系统的核心部件离子光学系统及辅助系统的参数选择、以及它们的结构特点作了详细的讨论，最后给出了系统的实验结果。并用离子束进行刻蚀工艺的研究，给出了ＦＩＢ在镀了一层金膜的硅样品进行刻蚀的电子扫描显微镜照的图象。
A focused ion beam (FIB) device with a two-stage lens was developed. It utilizes liquid metal ion sources: gallium and gold-silicon alloys. The ion beam spot is about 0.3μm and the minimum beam spot is 0.21μm. Can be stable, long-term operation. In this paper, the general structure of the system is discussed. The parameters of the ion optics system and its auxiliary system, which are the core components of the focused ion beam system, are discussed in detail, and their structural characteristics are discussed in detail. Finally, the experimental results of the system are given. And the ion beam etching technology research, given FIB in a layer of gold coated silicon samples were etched by scanning electron microscope image.